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Ultra High Purity Reagents Ultra-clean and High-purity Reagents: As one of the main enterprises of ultra-clean and high-purity reagents in China, the company engaged in the research, development, production, and sales of ultra-clean and high-purity reagents for nearly 20 years. The company has developed and incorporated advanced technology in ultra-clean and high-purity reagents. Many products have reached the G4 level, among which are the ultra-clean and high-purity hydrogen peroxide, the ultra-clean and high-purity sulfuric acid. Meanwhile, the ultra-clean and high-purity ammonium hydroxide have achieved an overall technical breakthrough, reaching the G5 level.

- Ultra High Purity Reagents

Semiconductor manufacturing process
H2O2H2SO4 NH4OH

Compliance: SEMI Grade5 standard

SEMI Grade5 For 14nm and further technology node

Product Information Details

NAME APPLICATION
H2O2 Widely used in the semiconductor front wet cleaning process, including the cleaning of particles, metal impurities and organic residues
H2SO4 Removing photoresist and other organic residues
NH4OH Removing water particle and cleaning polymer
NH4F·HF Etchant of silicon oxide used in wet etching process
HNO3 Applied in water recycling and cleaning process
HCI Applied in metal ion impurity removing process
C4H13NO Applied in water thinning process and also universal developer of photoresist
  • Hotline： 4000-300655
  • Email： sales@jingrui-chem.com.cn
  • Address： 168 Shanfeng Road, Wuzhong District, Suzhou
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Copyright © 2012-2025 Crystal Clear Electronic Material Co.,Ltd.苏ICP备05007813号

Technical：EEEKEJI

Hotline：4000-300655

Address：168 Shanfeng Road, Wuzhong District, Suzhou

Copyright © 2012-2025 Crystal Clear Electronic Material Co.,Ltd.

苏ICP备05007813号

Technical：EEEKEJI

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